| abstract |
This invention provides a method for processing a workpiece. A method according to one embodiment of this invention comprises a first step to supply a first gas containing a silicone-containing gas into a processing container accommodating a workpiece, a second step to produce the plasma of a rare gas in the processing container after conducting the first step, a third step to produce the plasma of a second gas containing oxygen gas in the processing container after conducting the second step, and a fourth step to produce the plasma of a rare gas in the processing container after conducting the third step. In this method, a silicone oxide film is formed by repeatedly conducting a sequence including the 1st through the 4th steps. Moreover, in this method, in at least any one step of the second, the third, and the fourth steps, negative DC voltage is applied on an upper electrode of a capacitve coupling type plasma processing apparatus. |