| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3c754156d9ab873a2efe5a3990dbf627 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14692
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78633
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1255
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1462
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1259
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1288 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-14 |
| filingDate |
2018-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb8a48a5f00c914f0f93d1f1165c97ee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f75a11c04669ed5a317f908eb2c838f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3067f3f04b962b2b13fc9143d8945fe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4d6a92a03b40817f145cb8a1658cb8f |
| publicationDate |
2020-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I689090-B |
| titleOfInvention |
Photo sensor and manufacturing method thereof |
| abstract |
A photo sensor and a method of manufacturing the photo sensor are provided. The method of manufacturing the photo sensor includes continuously depositing a second conductive layer, a photosensitive material layer and a first top electrode material layer on a substrate; forming a first patterned photoresist layer on the first top electrode material layer; using the first patterned photoresist layer as a mask to pattern the first top electrode material layer to form a first top electrode; removing the first patterned photoresist layer; using the first top electrode as a mask to pattern the photosensitive material layer to form a photosensitive layer; forming an insulation layer with an opening on the first top electrode; and forming a second top electrode on the insulation layer and the second top electrode is electrically connected to the first top electrode through the opening. |
| priorityDate |
2018-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |