| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2017-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e64ad8645410a694fdc772366a2226d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc9a29ba90b9f3443d76acddd56968c0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd7a44df2258d64351335afdebbe5007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a103399105aed76cca56947ee42834dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e484a6a7c81ef735afb067aaea3abc37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_802d961e267cab2ff5c3f5972b78b315 |
| publicationDate |
2020-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I683191-B |
| titleOfInvention |
Pattern-formation methods |
| abstract |
Pattern-formation methods comprise: (a) providing a substrate; (b) forming a photoresist pattern over the substrate; (c) applying a pattern treatment composition to the photoresist pattern, the pattern treatment composition comprising a solvent mixture comprising a first organic solvent and a second organic solvent, wherein the first organic solvent has a boiling point that is greater than a boiling point of the second organic solvent, and wherein the first organic solvent has a boiling point of 210°C or more; and (d) thereafter heating the photoresist pattern. The methods find particular applicability in the manufacture of semiconductor devices. |
| priorityDate |
2016-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |