| abstract |
A resist composition includes (A1) a resin having an acid-labile group, (A2) a resin which includes a structural unit represented by formula (I), and an acid generator: n nwherein R 1 represents a hydrogen atom or a C 3 to C 18 alicyclic hydrocarbon group, A 1 represents a single bond, a C 1 to C 6 alkanediyl group or *-A 2 -X 1 -(A 3 -X 2 ) a -(A 4 ) b -, * represents a binding site to an oxygen atom, A 2 , A 3 and A 4 each independently represent a C 1 to C 6 alkanediyl group, X 1 and X 2 each independently represent -O-, -CO-O- or -O-CO-, a represents 0 or 1, b represents 0 or 1, and R 2 represents a C 1 to C 13 fluorinated saturated hydrocarbon group. |