| abstract |
Provide novel coating solution for resist pattern coating.nn n n n n Contains component A: a polymer containing at least one hydroxyl or carboxyl group, component B: A-SO 3 H (where A is a linear or branched alkyl or fluorinated alkyl group having 1 to 16 carbon atoms) Group, an aromatic group having at least one alkyl group or a fluorinated alkyl group as a substituent, or an alicyclic group having 4 to 16 carbon atoms that may have a substituent.) The sulfonic acid represented by C), and C Ingredients: R 1 -OR 2 and/or R 1 -C(=O)-R 2 (wherein R 1 is a linear, branched or cyclic alkyl group having 3 to 16 carbon atoms or fluorine R 2 is a linear, branched or cyclic alkyl group having 1 to 16 carbon atoms or a fluorinated alkyl group.) The ether or ketone compound represented by the compound can dissolve the aforementioned polymer. Organic solvent, coating solution for resist pattern coating, and method for forming resist pattern or reverse pattern using the coating solution. |