http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I680696-B

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filingDate 2018-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1652395a492d5e7096092661d6e426e
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publicationDate 2019-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I680696-B
titleOfInvention Plasma processing device
abstract Plasma processing equipment, including: A first unbalanced terminal connected to the impedance matching circuit, a second unbalanced terminal grounded, a first balanced terminal, a second balanced terminal, and a first connection between the first unbalanced terminal and the first balanced terminal A coil and a balun of the second coil connecting the second unbalanced terminal and the second balanced terminal; Grounded vacuum container; A first electrode electrically connected to the first balanced terminal; A second electrode electrically connected to the second balanced terminal; and an adjustment reactor that affects the relationship between the first voltage applied to the first electrode and the second voltage applied to the second electrode.
priorityDate 2017-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Incoming Links

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Total number of triples: 23.