| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_154f5a8a983d88f296117dcc92946ab4 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2018-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7cd8b10e0cd6a126bc4e81430bd6370
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8f0e2e2b7c992b2c5176f6421e8d14c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8565cd1563e1d99d4680f2a45cf2816 |
| publicationDate |
2019-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I679496-B |
| titleOfInvention |
Hard mask composition and method for forming pattern |
| abstract |
The invention discloses a hard mask composition and a method for forming a pattern using the hard mask composition. The hard mask composition includes a polymer including a structural unit represented by Chemical Formula 1 and a solvent. [Chemical Formula 1] X is a polycyclic cyclic group containing at least three fused substituted or unsubstituted benzene rings, and * is the point of attachment. |
| priorityDate |
2017-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |