| abstract |
The composition for forming a film of the present invention is a solution having a pH of 4 to 10, and contains an aromatic compound having an amine group and an aromatic ring in one molecule, a polybasic acid having two or more carboxyl groups, and an oxidizing agent. As the oxidizing agent, hypochlorous acid, chlorous acid, chloric acid, perchloric acid, persulfuric acid, percarbonic acid, hydrogen peroxide, or organic peroxides can be used. The aromatic compound preferably contains a nitrogen-containing aromatic ring, and more preferably has a primary amine group or a secondary amine group. The composition for forming a film can be used for forming a film on the surface of a metal member, for example. |