| abstract |
The invention provides a pattern forming method and an electronic device manufactured by using the pattern forming method. The pattern forming method can obtain excellent adhesion between layers of a photoresist film, impart a high-definition pattern, and provide gas barrier properties and resistance. Laminates with high solvent properties.nn n n It consists of a step (1) of forming a film using a composition on a support, an exposure step (2) of irradiating a prescribed portion of the film with active energy rays to change the developability of the prescribed portion, and a developing film to obtain a map The pattern forming method of the image development step (3) of the pattern, and the composition uses a plurality of compositions having different solubility in the developing solution, and the acquired pattern has a multilayer structure. |