http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I678413-B

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-308
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filingDate 2016-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c16e478235409399e0017e6c2161058
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_633dfb2f08b0b46fbcb170fb985f9c9b
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publicationDate 2019-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I678413-B
titleOfInvention Etching solution and etching concentrated solution for multilayer film and etching method
abstract For the multilayer film of copper layer and molybdenum layer to be etched with one liquid, the cross-sectional shape of the edge after etching must be a forward-tapered shape without undercut, and no precipitates are generated in the etching solution. It is important to use it from time to time.nn n n An etching solution for a multilayer film containing a copper layer and a molybdenum layer containing hydrogen peroxide, an inorganic acid, an acidic organic acid, a neutral organic acid, an amine compound, and a hydrogen peroxide inhibitor. Since it does not contain an azole compound, No reactant is formed between them, and no precipitate is generated in the etching solution. Furthermore, the cross-sectional shape of the edge after etching can be made into a desired forward taper shape. Furthermore, since neither a phosphorus compound nor a fluorine compound is contained, the environmental load at the time of disposal is light.
priorityDate 2015-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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