| abstract |
Here, a photosensitive resin composition and an insulating film and an electronic device using the same are disclosed. By adjusting the amount of the polymerizable compound and the amount of residual monomers of the copolymer not consumed in the copolymerization reaction, the photosensitive resin composition can exhibit good pattern-forming properties when prepared into a cured film, and When a metal film is applied to the cured film, it also exhibits excellent surface forming properties, and thus can be effectively used as an interlayer insulating film in a TFT-LCD. |