| abstract |
The present invention provides a photosensitive resin composition which is used for two-wavelength exposure and is provided with excellent exposure sensitivity, adhesion and resolution. The photosensitive resin composition of the present invention is used to obtain a cured resin by exposing the first active light with a center wavelength of less than 390 nm and the second active light with a center wavelength of 390 nm or more, and the above-mentioned photosensitive resin combination The substance includes (A) an alkali-soluble polymer, (B) a compound having an ethylenic double bond, and (C) a photopolymerization initiator, and the photosensitive resin composition has a property to the first active light and the second active light. Photosensitivity of both, the (C) photopolymerization initiator contains anthracene and / or anthracene derivative. |