http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I677561-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-18 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-18 |
| filingDate | 2016-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88c5ccb4ca8966e2fb31ff7cc83e9d0a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2af2de2b0d7c7f56c821daf5914c8c4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da21019a8c64181518022047247ffe34 |
| publicationDate | 2019-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I677561-B |
| titleOfInvention | Etching solution for etching multilayer thin film including copper layer and titanium layer, etching method using the same, and substrate prepared by using the etching method |
| abstract | The invention provides: a multilayer comprising a copper layer mainly composed of copper and a titanium layer mainly composed of titanium on a substrate using at least one selected from the group consisting of glass, silicon dioxide and silicon nitride. An etching solution for etching a thin film; and an etching method for a multilayer thin film including a copper layer and a titanium layer using the etching solution; and a substrate prepared by the etching method. The etching solution contains an aqueous solution of the following components and has a pH of 1.5 to 2.5: (A) the concentration of hydrogen peroxide is 4.5 to 7.5% by mass; (B) the concentration of nitric acid is 0.8 to 6% by mass; (C) a fluorine compound The concentration is 0.2 to 0.5% by mass; (D) the concentration of azoles is 0.14 to 0.3% by mass; (E) the concentration of the amine compound is 0.4 to 10% by mass, the amine compound is selected from the group consisting of 1 or more Alkylamine (E1), a linear or branched alkyl group having 2 to 5 carbon atoms, which may be substituted with a methoxy group; having 1 or 2 linear or branched hydroxyalkane groups, 2 to 5 carbon atoms Alkanolamine (E2) having 1 or 2 linear or branched alkyl groups having 2 to 5 carbon atoms; linear or branched alkylene groups having 2 to 5 carbon atoms The concentration of one or more amine compounds of diamine (E3); and cyclohexylamine (E4); and (F) hydrogen peroxide stabilizer is 0.005 to 0.1% by mass. |
| priorityDate | 2015-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 196.