| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C323-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C49-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D251-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D251-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D249-20 |
| filingDate |
2016-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5c1124090f272b7c48d5fd52b317ddb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_955d038553434dd7285716fd6538e556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8f53c80493fd365cce94385c133101f |
| publicationDate |
2019-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I676082-B |
| titleOfInvention |
Photosensitive resin composition, photohardenable pattern formed thereby, and image display device including the same |
| abstract |
[Problem] The present invention provides a photosensitive resin composition. [Solution] The present invention relates to a photosensitive resin composition containing a thiol-based additive that satisfies specific parameters for thiol substituents in the molecule and an ultraviolet absorber having a maximum absorption wavelength (λ max ) of 335 to 365 nm. This can mitigate the effect of oxygen polymerization and effectively realize high sensitivity. At the same time, it can suppress the expansion of the line width of the pattern, and can realize high resolution when applied to products. |
| priorityDate |
2015-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |