| abstract |
The present invention provides an optical calibration device for calibrating an optical signal associated with a processing chamber, a characterization system for a plasma processing chamber, a method for characterizing a plasma processing chamber, and a cavity Chamber characterizer. In one example, the optical calibration device includes: (1) a housing, (2) a light source located within the housing and configured to provide a source light having a continuous spectrum, and (3) An optical shaping element located in the housing and configured to form the source light into a calibration light that simulates a plasma emission during an operation in the processing chamber. |