| abstract |
The present invention provides a new type of photolithographic adhesive, which is suitable for a variety of applications, including a negative-tone development method. Preferred resists include a first polymer that includes a first unit including a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety is in the light microsphere of the photoresist composition. An alkaline cleavage product was generated during the shadowing process. |