http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I672213-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c97f90ab12b35b650d5fd039ed7a41a5 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29L11-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C41-24 |
| filingDate | 2017-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7095dfefb93c0a78eba68781252bac7b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2cdd49fa52096fee73e28ce78b9fe16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_add7634558eb6c36320a13d0b32d45df |
| publicationDate | 2019-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I672213-B |
| titleOfInvention | Optical film manufacturing method |
| abstract | The present invention relates to a method of producing an optical film by a solution casting film forming method. The method is characterized in that a dopant having at least a raw material solution for casting an optical film on a support, a casting step of forming a mesh (cast film) on the support, a peeling step of peeling the mesh from the support, Drying the stripped web to obtain a drying step of the film, and a winding step of winding the film, and having at least the cleaning step of cleaning the surface of the support in the stripping step, and casting in the cleaning step The same dopant as in the production of the product forms a mesh on the support, and the residual solvent ratio Z of the mesh represented by the following formula when the mesh is peeled off from the support is adjusted to a range of Z=30 to 70%. Further, the peeling force necessary for peeling the web from the support in the cleaning step is greater than the peeling force necessary for peeling the web from the support in the peeling step at the time of product manufacture; residual solvent ratio Z (%) ={(WV)/V}×100 (wherein W represents the mass of the mesh containing the solvent, and V represents the mass after drying W at 120 ° C for 2 hours). |
| priorityDate | 2017-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 239.