| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32816
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-36 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458 |
| filingDate |
2015-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f6818c3db0019e575717d1423bc50dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a85b87c2d4821b06528e8a5237449d74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b29e5429a4f08e4648420425dd9be9e7 |
| publicationDate |
2019-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I671427-B |
| titleOfInvention |
Spray head and apparatus using the same |
| abstract |
One method used to remove material from a surface is ion etching. In some examples, ion etching involves transporting ions and reactive gases toward the substrate while maintaining a lower pressure on the portion of the substrate outside the local high-pressure transport area. Low pressure is achieved by restricting the delivery of high-pressure reactants to a small area and extracting excess reactants and by-products through a vacuum (these reactants and by-products leave this small area Before entering the larger substrate processing area). The disclosed technology can be used to increase yields while minimizing the possibility of adverse collisions between ions and other species present in the substrate processing area. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10998167-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10580628-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10825652-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11062920-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I702307-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11289306-B2 |
| priorityDate |
2014-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |