http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I670790-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec83ea8e6721b1a5654b038fdb9b223f |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B17-025 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68735 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67011 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate | 2018-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ecbd526cfe5ad2d315fe11a1d3ea5b3 |
| publicationDate | 2019-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I670790-B |
| titleOfInvention | Substrate processing apparatus and substrate processing method |
| abstract | The present invention provides a substrate processing apparatus and method for performing a process of using a processing liquid on a substrate, comprising: a substrate holding unit having a spin base for holding the substrate; and a blocking member having an upper surface of the substrate held by the substrate holding unit The opposing substrates face each other and have a larger diameter than the spin base; the partition member lifting unit moves the partition member between the blocking position and the retracted position, and the blocking position is a space between the opposing faces of the substrate and the upper surface from the upper surface The position of the side partition, the retracted position is a position that is retracted upward from the blocking position, and the space is not blocked from the side on the upper surface; and the plurality of fenders include a cylindrical inner side protection surrounding the substrate holding unit a plate, and a cylindrical outer shield surrounding the inner shield, the plurality of shields for capturing the treatment liquid discharged between the substrate and the partition member, the inner peripheral end of the outer shield being opposite to the inner shield At the end of the circumference, it is located radially outward. |
| priorityDate | 2017-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.