| abstract |
An object of the present invention is to provide a resin composition containing a novel polymer, a pattern forming method using the resin composition, and a method for synthesizing the polymer.nn n n The solution is a resin composition for forming an insulating film, which comprises a polymer having an structural unit represented by the following formula (1a) and a structural unit represented by the following formula (1b), and an organic solvent.nn n n Wherein T 0 represents a divalent organic group containing at least one extended aryl group in which at least one hydrogen atom is substituted with an amine group, and T 1 represents at least one exoaryl group having at least one substituent; A divalent organic group which is represented by the following formula (2): (wherein, Z represents a substituent represented by a divalent aliphatic group, an aromatic group or an alicyclic group which may have a substituent). |