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filingDate 2016-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36812bf696839f1dcd9e6f212f9979cd
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publicationDate 2019-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I668728-B
titleOfInvention Virtual gate used as interconnection and its preparation method
abstract A virtual gate process for interconnecting and a method of making the same are disclosed. Embodiments include: forming a dummy gate structure at a cell boundary on a semiconductor substrate, each dummy gate structure including a set of sidewall spacers and a cap layer disposed between the sidewall spacers; removing the first dummy gate a first sidewall spacer or at least a portion of the first cap layer on the first side of the pole structure, and a first gate contact trench formed over the first dummy gate structure; and filling the first gate with a metal The trench is contacted to form a first gate contact.
priorityDate 2015-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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