http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I668512-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1333 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2015-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4bc52415cb71261a284e32dad04bfe90 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9fdcc1e651c62e5856b1347e39dc8f16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e788618f99e2603e5af39fac2b093985 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8712f538fccc6b53e61d3b4fec6e46e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f01a32f561cb7aa08df312a215b07de8 |
| publicationDate | 2019-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I668512-B |
| titleOfInvention | Sensitive radiation linear resin composition, pattern manufacturing method, transparent insulating film, and display device |
| abstract | An object of the present invention is to provide a radiation sensitive linear resin composition excellent in adhesion to a substrate and optical lithography characteristics, a pattern manufacturing method using the above-mentioned sensitive radiation linear resin composition, and a composition using the above-mentioned radiation sensitive linear resin composition. A transparent insulating film and a display device including the transparent insulating film.nn n n The solution is a sensitive radiation linear resin composition of the present invention: a monomer comprising at least one element selected from the group consisting of La, Ce, Nd, Gd, Ho, Lu, Hf, and Ta, the above element The oxide, the compound of the above-mentioned element, the salt of the above element, and one or more selected from the group consisting of the alloy of the above-mentioned elements, and a filler having an average particle diameter of 200 nm or less, an alkali-soluble resin, and a polyfunctional compound Monomer, and photopolymerization initiator. The above polyfunctional monomer is preferably a polyfunctional monomer having 5 or more functional groups. Further, the content of the polyfunctional monomer is preferably 25 to 55 parts by mass based on 100 parts by mass of the alkali-soluble resin. |
| priorityDate | 2014-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 490.