| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-41
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-17 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L25-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L9-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-301
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-04 |
| filingDate |
2018-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f518f3a8073a77490a1d6274cbaa1546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f143a79ecdd1c20966ba5896d5342930
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9f7b36180e30ab3bb48ddac4cd4e029 |
| publicationDate |
2019-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I667261-B |
| titleOfInvention |
Positive photoresist composition, photoresist pattern using the same, and method of manufacturing the photoresist pattern |
| abstract |
The invention relates to a positive photoresist composition and a photoresist using the samenA pattern and a method for manufacturing a pattern. The positive-type photoresist composition includes an acrylic resin containing a repeating unit of a specific structure, and a photosensitive acid generating compound. |
| priorityDate |
2017-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |