| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_097405822d505467fd50f7100022cd56 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F216-06 |
| filingDate |
2014-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_77f6066559aab87381cef54bb8afd072
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75227dfc1c2a5738031ab24757541b74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c70db769584e766354051bf27c2cd60 |
| publicationDate |
2019-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I666224-B |
| titleOfInvention |
Wetting agent for semiconductor and polishing composition |
| abstract |
A wetting agent for semiconductors, which is a water-soluble polymer having a structural unit represented by formula (1) of 70 to 99 mol% and a specific structural unit represented by formula (2) of 1 to 30 mol%; [ -CH 2 CH (OH)-] (1)n n n [-CH 2 CH (X)-] (2) In formula (2), X represents an alkyl ether group having an alkyl group having 1 to 10 carbons, and the like. |
| priorityDate |
2013-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |