| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F27D2019-0028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6567
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F27D2007-063 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-0072
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-0063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F27D7-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F27B19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-581
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-0081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F27D19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-488
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F27B17-0025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-587
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-564 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105 |
| filingDate |
2015-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e05da0e4c6e427946e5082c03873edc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12b4ffc7a204d72acf45794272ea1c89
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c60fff14ef82dcc2e61b15e594b76db8 |
| publicationDate |
2019-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I665729-B |
| titleOfInvention |
Surface modification of major chamber components used to reduce chamber particles |
| abstract |
The embodiments described herein relate generally to apparatus and methods for thermally treating chamber components used in ultraviolet semiconductor processing chambers. Heat treatment of chamber components containing a single ceramic or glass object can reduce the possibility of the generation of particulates when the chamber components are exposed to a corrosive environment, such as exposure to ultraviolet light and ozone / oxygen radicals. A method of heat-treating a chamber component includes heating a single object to a desired temperature at an acceptable ramp rate for a desired period of time, and then cooling the single object at the ramp rate. |
| priorityDate |
2014-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |