http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I663488-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2015-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5bec54a5f3798bdac147cdd54a0c5c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_273d8650c2c2f123e39c9e8d9c3119a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd4c0bac3f5c0809ed041240e9a27fd0 |
| publicationDate | 2019-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I663488-B |
| titleOfInvention | Resistor pattern forming device and resist pattern forming method |
| abstract | An object of the present invention is to provide a resist pattern forming apparatus and a resist pattern forming method capable of obtaining a highly reliable pattern having both light transmittance and durability.nn n n The means for solving the problem is a resist pattern forming device, which is provided with a coating device for coating a resist film on a substrate; developing a resist film to develop a pre-pattern developing device; A dewatering device for dewatering a pre-pattern; a light-emitting device for illuminating a de-watered pre-pattern; and a heating device for heating and curing a pre-pattern after light irradiation. |
| priorityDate | 2014-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 229.