http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I662691-B

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12
filingDate 2014-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df5dc13124f38c33b00f1247138e1e82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac79c067a983b6ac76c9bb38646da883
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publicationDate 2019-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I662691-B
titleOfInvention Method for manufacturing array substrate for liquid crystal display
abstract A method of manufacturing an array substrate for a liquid crystal display, the method comprising: a) forming a gate wiring on a substrate; b) forming a gate insulating layer on a substrate having the gate wiring; c) insulating the gate Forming a semiconductor layer on the layer; d) forming a source electrode and a drain electrode on the semiconductor layer; and e) forming a primitive electrode connected to the drain electrode, wherein step a) or step d) includes: on the substrate or the Forming a Cu-based metal film on the semiconductor layer, and forming the gate wiring or the source electrode and the drain electrode by etching the Cu-based metal film using an etchant composition, and the etchant composition is for a Cu-based metal film The etchant composition includes hydrogen peroxide (H 2 O 2 ), phosphorous acid or a polybasic compound, and water.
priorityDate 2013-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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