| abstract |
The present invention provides a photosensitive polyfluorene imine composition, which comprises a polyfluorene imide resin having a structural unit represented by formula (1) and a structural unit represented by formula (2), and quinone azidesulfonic acid. Salts, thermal hardeners, and thermal acid generators. In formulae (1) and (2), n is an integer of 10 to 600, Ar 1 is a tetravalent organic group, Ar 2 is a divalent to tetravalent organic group, Ar 3 is a divalent aromatic group, and R 1 is one OH group or COOH group. The present invention also provides a photoresist film made of the photosensitive polyfluorene imine composition. |