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classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171
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filingDate 2014-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74e143edd9a28f21fafb40093c09bca5
publicationDate 2019-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I654639-B
titleOfInvention Ion generating device and ion generating method
abstract The present invention has been completed in view of such circumstances, and its purposenTo provide a technique for reducing the contamination of heavy metal ions during ion implantation and generating high productivity ions.nn n n The ion generating device (10) is provided with an arc chamber (n12), at least part of which is composed of a material containing carbon; a thermoelectron emitting portion (14) for discharging hot electrons into the arc chamber (12); and a gas introduction port (24) for source gas and compounding The gas is introduced into the arc chamber (12). The source gas introduced into the arc chamber contains a halide gas, and the composite gas introduced into the arc chamber contains a compound having carbon atoms and hydrogen atoms.
priorityDate 2013-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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