http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I650611-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_adfe7c88038a766ad6335947dac08ebd |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13394 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13398 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-286 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-402 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1339 |
| filingDate | 2013-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_643ec66b4a6b21ecffe86045941d06fa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1b38bdd366ea2e576c1df69cd1db1e4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd867d3b25a9451c448ace58b5e12953 |
| publicationDate | 2019-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I650611-B |
| titleOfInvention | Photosensitive resin composition for gap control material and gap control material |
| abstract | The present invention provides a photosensitive resin composition for a gap control material that has excellent adhesion to a substrate, can form a gap control material with high elastic recovery rate and high resistance strength, and has little development remaining. The photosensitive resin for a gap control material of the present invention The composition system is an adhesive polymer, which has a repeating unit having a cyclic structure in the main chain and a repeating unit having two or more oxyalkylene groups in a branched chain, and includes an acrylic resin. In one embodiment, the photosensitive resin composition for a gap control material of the present invention includes a polyfunctional monomer, a first photopolymerization initiator having a maximum absorption wavelength at a wavelength of 290 nm to 380 nm, and a maximum photopolymerization initiator at a wavelength of 230 nm to 290 nm. A second photopolymerization initiator that absorbs the wavelength. |
| priorityDate | 2012-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 232.