| abstract |
The polishing composition is composed of a filtered diluent obtained by a stock solution preparation step, a stock solution filtration step, a dilution step, and a diluent filtration step. In the raw liquid preparation step, the raw materials of the polishing composition are mixed to prepare a stock solution. In the raw liquid filtration step, the raw liquid is filtered. In the dilution step, the diluted stock solution is diluted to obtain a diluent. In the diluent filtration step, the diluent is filtered. The polishing composition is used, for example, for polishing a ruthenium substrate material for the purpose of producing a ruthenium substrate. |