| abstract |
The present invention provides a resist and a compound for a resist that do not impair basic physical properties such as resolution and line edge roughness (LER) of a chemically amplified resist, and are highly balanced.nn n n The present invention is a (meth) acrylic acid copolymer represented by the general formula (I), a method for producing the same, and a (meth) acrylic acid copolymer obtained by polymerizing the (meth) acrylic acid ester compound of the general formula (1) And its photosensitive resin composition.nn n n n n n n n n n (In the formula, R 1 represents a hydrogen atom or a methyl group, R 2 represents a linear or branched alkyl group having 2 to 4 carbon atoms, and R 3 may be the same or different and represented by the following formula (2) or (3 ), Etc.) n n n (Equations (2) and (3) are as described in this specification), |