| abstract |
A photoacid generating compound having the following structure n n n Wherein m, n, R 1 , R 2 , X, Y and Z - are as defined herein. The photoacid generating compound exhibits strong absorption and chemical sensitivity to far ultraviolet radiation while also absorbing longer wavelengths when it is desired to reduce chemical sensitivity. Also described is a polymer having a residue of the polymerizable version of the photoacid generating compound; a photoresist composition comprising the photoacid generating compound, the polymer or a combination thereof; and a use The photoresist composition forms a photoresist relief image. |