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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2dd9870c890413b57d9ac979e0b73322
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B9-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-36
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B9-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-36
filingDate 2017-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a25474554c026e2564b7b4a25098a8c8
publicationDate 2018-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I640663-B
titleOfInvention Tantalum carbide crystal (4H-SiC) growth method
abstract The invention provides a method for growing silicon carbide crystals (4H-SiC), which includes: preparing a mixture of polycrystalline silicon carbide and metal, and using the mixture of polycrystalline silicon carbide and metal as a raw material to grow silicon carbide crystal (4H-SiC) The polycrystalline silicon carbide and metal mixture is heated and melted, which can uniformly mix silicon and carbon, ensure the silicon content in the formed silicon carbide crystal (4H-SiC), and improve the quality of the silicon carbide crystal (4H-SiC). .
priorityDate 2016-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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