| abstract |
The present invention provides a new photobase generator suitable for use in photoresist, which corresponds to formula (I): X 1 -R 1 -OC (= O) N (R 2 ) R 3 (I)n n n Where X 1 is an optionally substituted aromatic group; R 1 is a linking group; and R 2 and R 3 are the same or different optionally substituted linear, branched or cyclic aliphatic groups or An optionally substituted aromatic group, wherein at least one of R 2 and R 3 is an optionally substituted branched chain alkyl group having 4 or more carbon atoms. |