http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I634385-B
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2014-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2018-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47444ed2c5a58d0565bf04697bba0171 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbdae697df2ea8f34a395e20f6b520a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3811d3b7ff94e8a62cc77825a3b15a7 |
publicationDate | 2018-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-I634385-B |
titleOfInvention | Radiation-sensitive resin composition, method for forming photoresist pattern, acid generator, and compound |
abstract | An object of the present invention is to provide a radiation-sensitive resin composition having excellent LWR performance.nn n n The solution of the present invention is a radiation-sensitive resin composition containing: a polymer having a structural unit containing an acid dissociable group; and an acid generator; the acid generator includes a sulfonate anion and a radiation-decomposable onium. A cation compound in which the sulfonate anion contains SO 3 - and a carbon atom at the α position of SO 3 - is bonded to a hydrogen atom or an electron donor group, and an electron withdrawing group is bonded to a carbon atom at the β position. Successor. It is preferred that the compound has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R 1 and R 2 are each independently a hydrogen atom or a monovalent electron-donating group. R 3 is a monovalent electron-withdrawing group. R 4 is a hydrogen atom or a monovalent hydrocarbon group. |
priorityDate | 2013-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 386.