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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b822ee046eb6c45d1e3bd9ce9c1782e
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78
filingDate 2014-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86278739d78f82e4e8019458d88aea98
publicationDate 2018-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I631711-B
titleOfInvention Semiconductor device
abstract An object of the present invention is to provide a semiconductor device using an oxide semiconductor with good electrical characteristics. An object of the present invention is to provide a highly reliable semiconductor device in which variations in electrical characteristics of a semiconductor device using an oxide semiconductor are suppressed. The semiconductor device includes: an island-shaped semiconductor layer on a base insulating layer; a pair of electrodes on the semiconductor layer; a barrier layer in contact with the bottom surface of the electrode; a gate electrode on the semiconductor layer; and between the semiconductor layer and the gate electrode Gate insulation. In addition, the semiconductor layer includes an oxide semiconductor, the base insulating layer includes silicon oxide or silicon oxynitride, the electrode includes Al, Cr, Cu, Ta, Ti, Mo, or W, and the barrier layer includes an oxide, and the oxide includes an oxide semiconductor One or more of the contained metal elements. In addition, when viewed in a plan view, the electrode and the barrier layer extend to the outside of the semiconductor layer.
priorityDate 2013-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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