| abstract |
The present invention provides a chemical-mechanical polishing composition comprising (a) abrasive particles, (b) an azole compound having an octanol-water logP of from about 1 to about 2, (c) a cobalt corrosion inhibitor, wherein the cobalt The corrosion inhibitor comprises an anionic head group and a C 8 -C 14 aliphatic tail group, (d) a cobalt accelerator, (e) an oxidizing agent that oxidizes cobalt, and (f) water, wherein the polishing composition has from about 3 to about 8.5. pH. The invention further provides a method of chemically-mechanically polishing a substrate using the chemical-mechanical polishing composition of the invention. Typically, the substrate contains cobalt. |