http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I628509-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2014-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c60ceb97ffa8c2ffcb34d3c17b95dc3f |
| publicationDate | 2018-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I628509-B |
| titleOfInvention | Pattern forming method, sensitizing ray or radiation sensitive resin composition, resist film, method of manufacturing electronic component, and electronic component |
| abstract | The present invention provides a pattern forming method, a sensitizing ray-sensitive or radiation-sensitive resin composition therefor, a resist film, a method of manufacturing an electronic component, and an electronic component, the pattern forming method being the same as the previous double patterning method A completely different novel pattern forming method is capable of refining the pitch of the pattern by one exposure and one development. In particular, it is possible to provide a pattern forming method capable of forming a pattern having a pitch equal to or less than half the pitch of a mask in the case of using a mask, a sensitizing ray-sensitive or radiation-sensitive resin composition therefor, and a resist. Film, electronic component manufacturing method and electronic component. |
| priorityDate | 2013-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 188.