http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I627499-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2015-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24ef466fc3607e925bf3e57161456513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2755db4cf58164bd00e91fcc1d759dcc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f1d6c3b67ac17d2438d8a930101821f |
| publicationDate | 2018-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I627499-B |
| titleOfInvention | Pattern forming method, sensitizing ray or radiation sensitive resin composition, and method of manufacturing electronic component |
| abstract | The present invention relates to a pattern forming method comprising the steps of forming a film using a photosensitive ray-sensitive or radiation-sensitive resin composition, the sensitized ray-sensitive or radiation-sensitive resin composition comprising ( A) a resin which increases in polarity due to the action of an acid and which has a reduced solubility for a developer containing an organic solvent, (B) a compound which generates an acid by irradiation with a specific actinic ray or radiation, and (C) a solvent; a step of exposing the film; and a step of developing the exposed film using a developing solution containing an organic solvent; and the resin (A) having a polar group protected by a leaving group which is decomposed by the action of an acid The structure, the leaving group is a group represented by the following formula (I).nn n n [Chemical 1] |
| priorityDate | 2014-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 273.