| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0275
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2013-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa485c7f56d146cd9f855a87b1388ab7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32a5230e224ad6a9587a081c5ba30f00 |
| publicationDate |
2018-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I625596-B |
| titleOfInvention |
Method for forming photoresist pattern and photoresist composition |
| abstract |
The present invention relates to a method for forming a photoresist pattern, which comprises the steps of forming a photoresist film with a photoresist composition, exposing the photoresist film, and using the developing solution to expose the exposed photoresist film. In the step of developing, the photoresist composition contains an acid generator which generates protonic acid by irradiation with exposure light, and a structural unit having a group (a) containing a proton-forming group and a cationic group, and has substantially no acid. A polymer of a structural unit of a dissociative group. The above group (a) preferably contains at least one selected from the group consisting of a nitrogen atom having a lone pair and a phosphorus atom having a lone pair. |
| priorityDate |
2012-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |