http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I619689-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e3b0a3dbf8d6c9712d86ea1383fd5327 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02197 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-55 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-472 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B3-12 |
| filingDate | 2014-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa2efe94f15665e7ce236a1cb8145541 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39484a3a19f976aec5b46fadbba446af http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8bf49d5b78bfca08a668c2efced2ed1 |
| publicationDate | 2018-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I619689-B |
| titleOfInvention | Composition for forming a strong dielectric film and manufacturing method thereof |
| abstract | An object of the present invention is to provide a composition for forming a ferroelectric thin film, and a method for producing the same, wherein the composition for forming a ferroelectric thin film is adjusted to a Young's modulus of a film by a calcination step and a calcination step ( Young's modulus, even if the coating film is thick every time, a film having high crystallinity which hardly cracks at the time of firing can be obtained, whereby the number of coating films can be reduced, and the production efficiency of the film can be improved.nn n n In the solution of the present invention, by using a composition for forming a ferroelectric thin film, even if the coating film is thick once, a film having high crystallinity which hardly cracks at the time of firing can be obtained, and the ferroelectric body is obtained. The film forming composition is characterized by comprising a ferroelectric thin film precursor, a solvent, and a reaction control substance, and forming a composition of a ferroelectric thin film by calcination and firing of the coating film, the reaction control substance The content is such that the Young's modulus of the film formed in the calcination stage of 200 ° C to 300 ° C is 42 GPa or less, and the Young's modulus of the film formed at the firing stage of 400 ° C to 500 ° C is 55 GPa or more. |
| priorityDate | 2013-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.