http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I617704-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7995660796c354a2881371a7406bf6dd |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-136286 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13439 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-18 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-18 |
| filingDate | 2013-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a9473b09c3d9e3bff0dea2e85aaf0e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6bd47913bb6f400f75e2b697a6858e7e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b96a28435983a2ddadf8dde7b56e8b2 |
| publicationDate | 2018-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I617704-B |
| titleOfInvention | Etching composition for copper-containing metal layer in display device and etching method using same |
| abstract | The invention relates to an etching composition for a copper-containing metal layer used in a display device. The composition includes at least one copper ion source, at least one fluoride ion source, at least one inorganic acid and / or a salt thereof, and a first nitrogen-containing organic compound. A compound, a second nitrogen-containing organic compound, and at least one organic acid and / or a salt thereof, the first nitrogen-containing organic compound is selected from the group consisting of fatty amines, aromatic amines, and any combination thereof, and the second nitrogen-containing organic compound The compound is selected from the group consisting of a nitrogen-containing heterocyclic ring, a multi-chargeable amine compound, and any combination thereof. The etching composition according to the present invention can provide excellent etching uniformity without causing damage to the underlying semiconductor layer. |
| priorityDate | 2012-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 155.