abstract |
An object of the present invention is to provide a passivation film that simultaneously establishes electrical insulation, heat resistance, solvent resistance, and dry etch back characteristics.nn n n The solution is to contain the following formula (i): (In the formula, T 0 represents a sulfonyl group, a fluoroalkylene group, a cyclic alkylene group, a substituted aryl group, or a substituted aryl group and a fluoroalkylene group or a cyclic alkylene group Of the unit structure of the polymer, the polymer having at least one group having a structure of formula (2-A), formula (2-B), or both of its ends, branches, or main chain Composition for passivation film formation.n n n -C≡C- formula (2-A)nn n n n n n n n n n The polymer may contain the following formula (1): The unit structure. |