http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I615672-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B65D85-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B65D51-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A63B21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A63B23-16 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-33 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 2014-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4152514a24ab35c25821d05aff007d7f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8712f538fccc6b53e61d3b4fec6e46e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4bc52415cb71261a284e32dad04bfe90 |
| publicationDate | 2018-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I615672-B |
| titleOfInvention | Radiation-sensitive resin composition |
| abstract | A problem of the present invention is to provide a radiation-sensitive resin composition, a method for forming a patterned resin film using the radiation-sensitive resin composition, an insulating film formed using the radiation-sensitive resin composition, and the method comprising: The display device of an insulating film, wherein the radiation-sensitive resin composition can form a cured film having excellent transparency, and even after development using an aqueous solution of tetramethylammonium hydroxide after exposure, the radiation-sensitive resin composition is exposed to light. The part will not overly dissolve.nn n n In order to solve this problem, the present invention is to formulate (A) an alkali-soluble resin, (B) a photopolymerizable compound, and (C) a photopolymerization initiator containing a oxime ester compound having a specific structure in a radiation-sensitive resin composition. Among them, the aforementioned (A) alkali-soluble resin is composed of a copolymer, and the copolymer includes (a1) a unit derived from an unsaturated carboxylic acid, and a specific amount (a2) derived from a lipid containing no epoxy group. Units of unsaturated compounds of cyclic skeleton. |
| priorityDate | 2013-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 399.