Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-033 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-92 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30608 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
filingDate |
2012-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2018-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12a8dc53697a9aa533b75f401ecb5452 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d45cc88f94e59d5b90c46f391b89d79c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ef58a1bb9ec60924e5ac12d9a312802 |
publicationDate |
2018-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-I614804-B |
titleOfInvention |
Method for manufacturing semiconductor substrate product and etching method therefor |
abstract |
The invention provides a method for manufacturing a semiconductor substrate product. The method for manufacturing a semiconductor substrate product of the present invention includes the following steps: preparing an aqueous solution containing a quaternary alkylammonium hydroxide of 7 mass% or more and 25 mass% or less; and preparing silicon having a polycrystalline silicon film or an amorphous silicon film. A semiconductor substrate of a film; and heating the aqueous solution to 80 ° C. or higher and applying the semiconductor substrate to the semiconductor substrate to etch at least a part of the silicon film. |
priorityDate |
2011-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |