| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2011-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be835a103388ce1c8816005f37adda0b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_802d961e267cab2ff5c3f5972b78b315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_259d2b64edd000f71fd4e04d2f0d5ae8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_156cd0ccfd8d84e45134f77d4f5933a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e82653ba4444ac57375740ceeb8f682
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc9a29ba90b9f3443d76acddd56968c0 |
| publicationDate |
2018-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I612387-B |
| titleOfInvention |
Composition and process for containing saccharide components for photolithography |
| abstract |
A new photoresist composition for immersion lithography is provided. Preferred photoresist compositions of the invention include one or more materials having a sugar substitution. The particularly preferred photoresist of the present invention can reduce the precipitation of the resist material into the wetting fluid in contact with the resist layer during the immersion lithography process. |
| priorityDate |
2010-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |