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filingDate 2015-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1db2255f20282a526feefb0abd50f7c0
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publicationDate 2018-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I611275-B
titleOfInvention Photolithography developing component and method for patterning lithography
abstract A method for patterning a photolithographic technique, comprising the steps of: providing a substrate; forming a layer of material over the substrate; exposing one of the layers of the material to radiation; and removing one of the layers of the material in the developer The exposed portion produces a layer of patterned material. The developer has a Log P value greater than 1.82 and contains an organic solvent. In one embodiment, the organic solvent is a n-butyl acetate derivative represented by the chemical formula CH 3 R 5 CHR 4 CHR 3 CHR 2 COOCH 2 R 1 wherein R 1 , R 2 , R 3 , R 4 , and R 5 Each is selected from the group consisting of hydrogen groups, methyl groups, ethyl groups, and fluoroalkyl groups.
priorityDate 2015-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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