Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-593 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-32 |
filingDate |
2016-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2018-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5c1124090f272b7c48d5fd52b317ddb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_955d038553434dd7285716fd6538e556 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_398e6462a18f8e605241078c5d5abcf2 |
publicationDate |
2018-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-I611265-B |
titleOfInvention |
Photosensitive resin composition, photohardenable pattern, and image display device |
abstract |
A photosensitive resin composition and a photocurable pattern formed therefrom, and more specifically, a photosensitive resin composition comprising: a first alkali-soluble resin (A) including a repeating unit having a specific structure, and a second alkali-soluble resin. The resin (B), the monofunctional polymerizable compound (C), the polyfunctional polymerizable compound (D), the photopolymerization initiator (E), and the solvent (F) having a specific structure are excellent in low-temperature curing reactivity and can be formed. Pattern with excellent adhesion and chemical resistance to the lower substrate. |
priorityDate |
2015-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |