http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I610337-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67103 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B31-02 |
| filingDate | 2015-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38799704779a4800e945427985a47b98 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cab44c6dba749a5c1ce748cd66542645 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_029ad81d4682edb4c7fb968ad50e2ffa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b74157be6d79e3aa9a9c5c19c366905c |
| publicationDate | 2018-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I610337-B |
| titleOfInvention | Heat treatment device, heat treatment method and recording medium |
| abstract | The present invention aims to provide a heat treatment device and the like, which can uniformly and quickly heat a substrate that is warped during a temperature rise process. In the heat treatment apparatus 1, a substrate W that is warped during the heating process and then returned to a flat substrate W is placed on the heating plate 2 adjusted to the heating temperature. The support member 3 supports the substrate W from the bottom surface side. And it moves up and down between the transmission position on the upper side and the position on the lower side of the heating plate 2. While the control unit 4 lowers the substrate W from the transfer position, the substrate W is heated to a temperature caused by warpage on the upper side of the heating plate 2 by the heat from the heating plate 2, and then the substrate W is restored to After the flat recovery time has elapsed, the substrate W is placed on the heating plate 2. |
| priorityDate | 2014-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.